X-ray scattering from uniform and patterned indium tin oxide thin films

Abstract

Grazing incidence specular and diffuse x-ray scattering have been used to measure the thickness and roughness of indium tin oxide thin films deposited on glass. The techniques have been used to calibrate the etching rate, determine the variation of the top surface roughness changes with etching time and measure non-destructively the period and atomic-scale roughness of 400 nm period gratings produced by etching after laser interferometric patterning of a photoresistive layer. The propagation of the roughness through the polymer light emitting layer has also been examined.