Sidewall deposition film in platinum etching with Ar/halogen mixed gas plasmas
- 1 September 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (5), 1747-1751
- https://doi.org/10.1116/1.589519
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- Platinum Etching and Plasma Characteristics in RF Magnetron and Electron Cyclotron Resonance PlasmasJapanese Journal of Applied Physics, 1993