Stable a-Si:H fabricated from halogenous silane by ECR hydrogen plasma
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 47-50
- https://doi.org/10.1016/0022-3093(93)90488-j
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Control of nucleation and growth in the preparation of crystals by plasma-enhanced chemical vapour depositionPhilosophical Magazine Part B, 1991
- Microwave-Excited Plasma CVD of a-Si:H Films Utilizing a Hydrogen Plasma Stream or by Direct Excitation of SilaneJapanese Journal of Applied Physics, 1987
- Light-induced metastable defects in hydrogenated amorphous silicon: A systematic studyPhysical Review B, 1985