Core-level binding-energy shifts, thermodynamic predictions, and morphologies for metal-Si and metal-Ge interfaces
- 15 September 1987
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 36 (9), 4761-4768
- https://doi.org/10.1103/physrevb.36.4761
Abstract
High-resolution core-level photoemission results show two or more distinct reacted chemical species for a wide variety of metal-Si and metal-Ge interfaces. Assuming that the first reacted species at the interface have ∼50 at. % Si (or Ge) and the second species are solid solutions of Si (or Ge) in metal matrices, we find reasonable agreement between calculated and experimental chemical shifts. These analyses allow correlation between the reaction products observed at metal-semiconductor interfaces and the bulk thermodynamic properties of the constituents. These results are in agreement with those obtained from a morphological model for evolving interfaces developed by Butera, del Giudice, and Weaver.Keywords
This publication has 63 references indexed in Scilit:
- Systematics of electronic structure and local bonding for metal/GaAs(110) interfacesJournal of Vacuum Science & Technology A, 1987
- Electronic properties on silicon-transition metal interface compoundsSurface Science Reports, 1985
- Reactions at a rare-earth–GaAs interface: Ce/GaAs(110)Physical Review B, 1985
- Ni-Si(111) interface: Growth of Ni2Si islands at room temperatureApplied Physics Letters, 1984
- Microscopic properties and behavior of silicide interfacesSurface Science, 1983
- Systematics of chemical structure and schottky barriers at compound semiconductor-metal interfacesSurface Science, 1983
- Chemical bonding and Schottky barrier formation at transition metal–silicon interfacesJournal of Vacuum Science & Technology A, 1983
- The structure and properties of metal-semiconductor interfacesSurface Science Reports, 1982
- Interface chemical reaction and diffusion of thin metal films on semiconductorsThin Solid Films, 1982
- Silicide interface stoichiometryJournal of Vacuum Science and Technology, 1981