High mobility of two-dimensional electrons at the GaAs/n-AlGaAs heterojunction interface

Abstract
Mobility of the two‐dimensional electron gas as high as 61 500 cm2/V sec, with a carrier concentration of 5.7×1011 cm−2, was obtained at 66 K in a selectively doped GaAs/n‐AlGaAs heterojunction structure grown by molecular beam epitaxy. This mobility is a factor of 2–3 larger than any reported so far in similar structures.