Antireflection sub-wavelength gratings fabricated by spin-coating replication
- 1 March 2005
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 78-79, 287-293
- https://doi.org/10.1016/j.mee.2004.12.039
Abstract
No abstract availableThis publication has 28 references indexed in Scilit:
- Nano-structured anti-reflective surfaces replicated by hot embossingMicroelectronic Engineering, 2002
- Subwavelength Antireflection Gratings for Light Emitting Diodes and Photodiodes Fabricated by Fast Atom Beam EtchingJapanese Journal of Applied Physics, 2002
- Subwavelength-structured antireflective surfaces on glassThin Solid Films, 1999
- Nanoscale silicon field effect transistors fabricated using imprint lithographyApplied Physics Letters, 1997
- Imprint lithography with sub-10 nm feature size and high throughputMicroelectronic Engineering, 1997
- Optical properties of nanoscale, one-dimensional silicon grating structuresJournal of Applied Physics, 1996
- Nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Optimal design for antireflective tapered two-dimensional subwavelength grating structuresJournal of the Optical Society of America A, 1995
- Antireflection effect in ultrahigh spatial-frequency holographic relief gratingsApplied Optics, 1987
- Optical elements with ultrahigh spatial-frequency surface corrugationsApplied Optics, 1983