Die Abscheidung von Bornitridschichten auf Siliziumsubstraten und ihre Verwendung als Diffusionsquelle
- 16 November 1971
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 8 (1), 71-78
- https://doi.org/10.1002/pssa.2210080106
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Preparation and Properties of Thin Film Boron NitrideJournal of the Electrochemical Society, 1968
- The average conductivity of diffused layers in semiconductorsSolid-State Electronics, 1964
- Resistivity of Bulk Silicon and of Diffused Layers in SiliconBell System Technical Journal, 1962