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D-C Dielectric Breakdown of Amorphous Silicon Dioxide Films at Room Temperature
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D-C Dielectric Breakdown of Amorphous Silicon Dioxide Films at Room Temperature
D-C Dielectric Breakdown of Amorphous Silicon Dioxide Films at Room Temperature
FW
F. L. Worthing
F. L. Worthing
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1 January 1968
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 115
(1)
,
88
https://doi.org/10.1149/1.2411029
Abstract
No abstract available
Keywords
SILICON DIOXIDE
DIOXIDE FILMS
BREAKDOWN
DIELECTRIC
ROOM TEMPERATURE
AMORPHOUS SILICON
Cited by 20 articles