Microfabrication of circuits for magnetic bubbles of diameter 1 μm and 2 μm

Abstract
We describe microfabrication techniques for Permalloy circuits for magnetic bubbles of diameter 1 μm and 2 μm. Patterns are defined by electron beam on an x‐ray mask. X‐ray lithography and ion milling are employed to replicate the pattern in Permalloy.

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