New microlithography technologies based on resist irradiation by low energy electrons
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4), 307-310
- https://doi.org/10.1016/0167-9317(94)90162-7
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Electron beam lithography resolution upon exposure of superthick resist layersMicroelectronic Engineering, 1989