Metastable molecular precursor for the dissociative adsorption of oxygen on Si(111)
- 30 December 1985
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 55 (27), 2979-2982
- https://doi.org/10.1103/physrevlett.55.2979
Abstract
The initial adsorption of oxygen on Si(111) surfaces proceeds via a molecular intermediate which is precursor to the stable dissociated adsorption state. This metastable precursor can only be observed under certain conditions; its conversion to the stable state depends on temperature, probe, surface structure, impurities, and oxygen coverage. The precursor is likely to be a peroxy-bridge configuration whereas the stable dissociated oxygen species forms short-bridge bonds between adjacent Si atoms.Keywords
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