Nanometer Recording on Graphite and Si Substrate Using an Atomic Force Microscope in Air

Abstract

Nanometer recording has been demonstrated with tens nanometer diameter pits and gold mounds formed on graphite and Si substrate using an atomic force microscope at atmospheric pressure. The probe is prepared by means of coating thin gold film on an SiO₂ birdbeak-type cantilever probe, fabricated by a Si microprocess. Applications of voltage pulses between the probe and the graphite make about 10-nm diameter pits and Au mounds. Furthermore, about 50-nm to 30-nm diameter Au mound formations on Si wafer covered with natural silicon oxide are also demonstrated. The results indicate that the technique has potentials to achieve Tera-bit/in² highly packed storage in air, and directly to write nanometer sized patterns on an insulating thin film.