An implantation terminal for the preparation of p-n junction particle detectors was set up on a multipurpose isotope separator. To provide for homogeneous implantation. the ion beam is swept in the horizontal direction and the samples are moved vertically. In order to be able to implant samples with different geometry two different sample moving systems can be mounted in the implantation chamber. A rotating drum is used for round wafers. a rotating disc in connection with a rotating diaphragm is provided for very elongated samples. Implanted resistive layers on a wafer have resistances which differ by less than ±1 %.