Chemical vapor deposition and characterization of nitrogen doped TiO2 thin films on glass substrates
- 1 December 2009
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 518 (4), 1299-1303
- https://doi.org/10.1016/j.tsf.2009.04.070
Abstract
No abstract availableKeywords
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