Ellipsometric Studies on Plasma-Oxidation Process of Iridium-Carbon Composite Films
- 1 February 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (2R), 189
- https://doi.org/10.1143/jjap.25.189
Abstract
The plasma oxidation of Ir-C films has been investigated using ellipsometry and XPS (X-ray photoelectron spectroscopy). The XPS measurements show that the concentration of C atoms in the Ir-C film is greatly decreased by plasma oxidation, suggesting that selective sputtering of C atoms from the Ir-C film makes the film porous and facilitates its oxidation. A quantitative analysis of the ellipsometric measurements at a wavelength of 633 nm shows that the refractive index, extinction coefficient and steady-state thickness of the oxide films lie in the ranges 1.5±0.1, 0.2±0.1 and 50-110 nm, respectively. A voltammogram of the oxide film indicates that the electrochemical reactions taking place at the film-electrolyte (0.5 M H2SO4) interface are highly reversible.Keywords
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