The improvement of the atmospheric-pressure glow plasma method and the deposition of organic films
- 14 March 1990
- journal article
- research article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 23 (3), 374-377
- https://doi.org/10.1088/0022-3727/23/3/021
Abstract
Recently the authors developed an atmospheric-pressure glow discharge plasma method which can be applied to surface treatment and deposition on insulating surfaces for purposes of large-scale system treatment. However, this method was not able to treat metallic substrates. Consequently, they have improved the upper electrode to enable metal substrates to be treated. Some organic films were polymerised by the atmospheric-pressure method. Comparison of results from the atmospheric-pressure glow plasma method with those obtained by the low-pressure glow plasma method showed no differences in the chemical structures of plasma-polymerised films.Keywords
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