Sputtering of high TcNb3Ge and Nb3Si
- 1 January 1979
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Magnetics
- Vol. 15 (1), 494-497
- https://doi.org/10.1109/tmag.1979.1060250
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
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- Growth of A-15 Nb3Ge by co-evaporationIEEE Transactions on Magnetics, 1977
- Phase diagram of electron-beam codeposited Nb3Ge: The influence of oxygen and other gasesIEEE Transactions on Magnetics, 1977
- Low-pressure sputtering of high-T c Nb3GeJournal of Low Temperature Physics, 1976
- Oxygen distribution in sputtered Nb-Ge filmsApplied Physics Letters, 1976
- Preparation and analysis of superconducting Nb-Ge filmsPhysical Review B, 1975
- Selective thermalization in sputtering to produce high TcfilmsIEEE Transactions on Magnetics, 1975