Ultra-high vacuum preparation and characterization of ultra-thin layers of SiO2 on ZrO2 and TiO2 by chemical vapour deposition of Si(OEt)4

Abstract

SiO₂ overlayers, prepared by chemical vapour deposition of Si(OEt)₄, were identified by ion scattering spectroscopy and Auger electron spectroscopy to be ultra-thin films uniformly coating ZrO₂, but this was not the case for TiO₂.