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Steady-state mass balance approach to substrate biased rf sputtering
Home
Publications
Steady-state mass balance approach to substrate biased rf sputtering
Steady-state mass balance approach to substrate biased rf sputtering
DD
D. B. Dove
D. B. Dove
RG
R. J. Gambino
R. J. Gambino
JC
J. J. Cuomo
J. J. Cuomo
RK
R. J. Kobliska
R. J. Kobliska
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1 July 1976
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science and Technology
Vol. 13
(4)
,
965-968
https://doi.org/10.1116/1.569030
Abstract
No abstract available
Cited by 6 articles