Reactive Ion Etching of Silicon Carbide with Fluorine-Containing Plasmas
- 1 January 1995
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Recent developments in SiC single-crystal electronicsSemiconductor Science and Technology, 1992
- Applications for 6H-Silicon Carbide DevicesPublished by Springer Nature ,1992