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High-density plasma etching of compound semiconductors
Home
Publications
High-density plasma etching of compound semiconductors
High-density plasma etching of compound semiconductors
RS
R. J. Shul
R. J. Shul
GM
G. B. McClellan
G. B. McClellan
RB
R. D. Briggs
R. D. Briggs
DR
D. J. Rieger
D. J. Rieger
S. J. Pearton
S. J. Pearton
CA
C. R. Abernathy
C. R. Abernathy
JL
J. W. Lee
J. W. Lee
CC
C. Constantine
C. Constantine
CB
C. Barratt
C. Barratt
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1 May 1997
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 15
(3)
,
633-637
https://doi.org/10.1116/1.580696
Abstract
No abstract available
Keywords
MATERIALS SCIENCE
INDUCTIVE COUPLED PLASMA
PLASMA ETCHING
SCANNING ELECTRON MICROSCOPY
ROOT MEAN SQUARE
SURFACE ROUGHNESS
ELECTRON CYCLOTRON RESONANCE
ATOMIC FORCE MICROSCOPY
CHEMICAL REACTION
GALLIUM ARSENIDE
Cited by 107 articles