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Oxide Breakdown due to Charge Accumulation during Plasma Etching
Home
Publications
Oxide Breakdown due to Charge Accumulation during Plasma Etching
Oxide Breakdown due to Charge Accumulation during Plasma Etching
KR
K. ‐H. Rydén
K. ‐H. Rydén
HN
H. Norström
H. Norström
CN
C. Nender
C. Nender
SB
S. Berg
S. Berg
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1 December 1987
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 134
(12)
,
3113-3118
https://doi.org/10.1149/1.2100351
Abstract
No abstract available
Cited by 24 articles