Process design and emission properties of gated n+ polycrystalline silicon field emitter arrays for flat-panel display applications
- 1 March 1997
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 15 (2), 472-476
- https://doi.org/10.1116/1.589602