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A practical trench isolation technology with a novel planarization process
Home
Publications
A practical trench isolation technology with a novel planarization process
A practical trench isolation technology with a novel planarization process
GF
G. Fuse
G. Fuse
HO
H. Ogawa
H. Ogawa
KT
K. Tateiwa
K. Tateiwa
IN
I. Nakao
I. Nakao
SO
S. Odanaka
S. Odanaka
MF
M. Fukumoto
M. Fukumoto
HI
H. Iwasaki
H. Iwasaki
TO
T. Ohzone
T. Ohzone
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1 January 1987
proceedings article
Published by
Institute of Electrical and Electronics Engineers (IEEE)
https://doi.org/10.1109/iedm.1987.191535
Abstract
No abstract available
Keywords
STANDARD DEVIATION
BORON
ETCHING
RESISTS
PLANARIZATION
ION IMPLANTATION
THRESHOLD VOLTAGE
CAPACITORS
Cited by 27 articles