Enhanced Deposition in Electron Beam Targets Due to Beam Stagnation

Abstract

When a 1-MV, 315-kA, self-pinched electron beam is focused onto a thin-wall spherical target, the energy deposition per unit mass is 5 times larger than for a similar beam interacting with a thick target. Numerical modeling of the electron flow in the diode indicates that modification of electric and magnetic fields and electron trajectories by the target produces multiple passes through a thin target and an increase in beam electron density in the target. This produces the enhanced energy deposition in the target.