Characteristics of srbi2ta2o9 thin films fabricated by the r. f. magnetron sputtering technique
- 1 February 1997
- journal article
- Published by Taylor & Francis in Integrated Ferroelectrics
- Vol. 15 (1-4), 115-125
- https://doi.org/10.1080/10584589708015702
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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