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Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors
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Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors
Application of Diffusion from Implanted Polycrystalline Silicon to Bipolar Transistors
YA
Youichi Akasaka
Youichi Akasaka
KT
Katsuhiro Tsukamoto
Katsuhiro Tsukamoto
MK
Mikio Kawaguchi
Mikio Kawaguchi
HS
Hirokazu Sato
Hirokazu Sato
KH
Kazuo Horie
Kazuo Horie
HK
Hiroyoshi Komiya
Hiroyoshi Komiya
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1 January 1976
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 15
(S1)
https://doi.org/10.7567/jjaps.15s1.49
Abstract
No abstract available
Keywords
IMPLANTED POLYCRYSTALLINE
POLYCRYSTALLINE SILICON
BIPOLAR TRANSISTORS
APPLICATION OF DIFFUSION
Cited by 2 articles