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Accurate Theoretical Arsenic Diffusion Profiles in Silicon from Processing Data
Home
Publications
Accurate Theoretical Arsenic Diffusion Profiles in Silicon from Processing Data
Accurate Theoretical Arsenic Diffusion Profiles in Silicon from Processing Data
RJ
R. K. Jain
R. K. Jain
RO
R. J. Van Overstraeten
R. J. Van Overstraeten
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1 April 1975
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 122
(4)
,
552-557
https://doi.org/10.1149/1.2134258
Abstract
No abstract available
Cited by 12 articles