Depth profiling of an ion plated interface by ion scattering spectrometry

Abstract
The depth profile of composition for gold films ion plated onto chromium has been investigated through the region of the interface by ion scattering spectrometry and compared with similar films formed by electron beam evaporation and rf sputtering. Significant grading of the composition at the interface is observed, but not uniquely in the ion plated films. Rather a gradual transition from pure chromium to pure gold occurs over the distance of 100 atomic layers in both the ion plated and evaporated films irrespective of bias voltage on the substrate. On the other hand, sharp interfaces with no composition grading are observed when the chromium substrates are not cleaned by sputter etching to remove the thin oxide layer immediately prior to coating. In no case is there any indication of composition grading on the scale of microns as reported in the literature for copper ion-plated onto steel.