Recrystallization of LPCVD amorphous Si films using F+ implantation
- 1 June 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 245 (1-2), 228-233
- https://doi.org/10.1016/0040-6090(94)90905-9
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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