Low temperature deposition of amorphous silicon oxide and silicon nitride films
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 925-928
- https://doi.org/10.1016/0022-3093(85)90812-9
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Near neighbor chemical bonding effects on Si atom native bonding defects in silicon nitride and silicon dioxide insulatorsJournal of Vacuum Science & Technology B, 1985
- Remote plasma enhanced CVD deposition of silicon nitride and oxide for gate insulators in (In, Ga)As FET devicesJournal of Vacuum Science & Technology A, 1985
- Decomposition kinetics of a static direct current silane glow dischargeThe Journal of Physical Chemistry, 1984