Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition
Top Cited Papers
- 1 November 2000
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 18 (6), 3181-3184
- https://doi.org/10.1116/1.1319689
Abstract
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga + focused ion beam assisted deposition using a aromatic hydrocarbon precursor. The characterization of depositedfilm on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the depositionfilm is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bellows with 0.1 μm dimension were fabricated as parts of the microsystem. Furthermore, microstructure plastic arts is advocated as a new field using microbeam technology, presenting one example of a microwine glass with 2.75 μm external diameter and 12 μm height.Keywords
This publication has 4 references indexed in Scilit:
- Nanostructure fabrication using electron beam and its application to nanometer devicesProceedings of the IEEE, 1997
- Characterization and Application of Materials Grown by Electron-Beam-Induced DepositionJapanese Journal of Applied Physics, 1994
- X-ray mask repair with focused ion beamsJournal of Vacuum Science & Technology B, 1990
- Raman spectra of diamondlike amorphous carbon filmsJournal of Applied Physics, 1988