An energy dispersion spectroscopy technique to measure titanium silicide lateral diffusion

Abstract

Energy dispersion spectroscopy has been used to measure the amount of titanium silicide formed on wedged SiO2 layers. The best experimental conditions for the measurements were determined using a Monte Carlo calculation for the x-ray yields and for the evaluation of the lateral resolution. On the basis of these calculations we have chosen during measurements a step displacement of the electron beam of ∼40 nm. With this technique lateral extension of titanium silicide ranging from 120 to 520 nm was measured. The method has been applied to the analysis of lateral diffusion in titanium silicide obtained by annealing either in a furnace or in a rapid thermal apparatus.