Observations of anisotropic diffused layer sheet resistance in EFG silicon ribbon solar cells
- 15 April 1978
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 32 (8), 503-505
- https://doi.org/10.1063/1.90102
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Reduction of grain boundary recombination in polycrystalline silicon solar cellsApplied Physics Letters, 1977
- Orientation dependence of defect structure in EFG silcion ribbonsApplied Physics Letters, 1976
- Repeated Removal of Thin Layers of Silicon by Anodic OxidationJournal of the Electrochemical Society, 1976
- Studies of the uniformity characteristics of EFG silicon ribbonPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1975
- Oxidation, defects and vacancy diffusion in siliconPhilosophical Magazine, 1969
- Detailed analysis of thin phosphorus-diffused layers in p-type siliconSolid-State Electronics, 1961