Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
- 1 September 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (9A), L1647
- https://doi.org/10.1143/jjap.28.l1647
Abstract
Space-resolved optical emission spectroscopy was applied to investigate the deposition process of amorphous hydrogenated carbon (a-C:H) in a dc glow discharge. The CH(A2 Δ→ X2Π) emission was strongly enhanced and localized near the cathode surface in a CH4/Ar discharge. The time evolution of the CH emission along with the deposition or etching of a-C:H films revealed the CH radical formation by two surface processes: (i) fragmentation of energetic hydrocarbon particles at their impact on the cathode, and (ii) sputtering of the already deposited a-C:H film.Keywords
This publication has 4 references indexed in Scilit:
- Mass spectroscopic investigation of the CH3 radicals in a methane rf dischargeApplied Physics Letters, 1989
- Process monitoring of a-C:H plasma depositionJournal of Vacuum Science & Technology A, 1987
- Carbonization in tokamaksJournal of Nuclear Materials, 1987
- Optical studies of hydrogenated amorphous carbon plasma depositionApplied Physics Letters, 1986