Increase in Uniformity of Amorphous GdCo Films by Control of Oxygen Quantity

Abstract

The spatial uniformity of compositions and of the magnetic property of rf-sputtered amorphous GdCo thin films was investigated by Auger electron spectroscopy, electron probe microanalyzer, and polar Kerr hysteresis loops. It was found that by applying a negative dc bias to the substrate during sputtering, the quantity of oxygen incorporated into the film decreases and considerable uniformity of the oxygen and of magnetic property is obtained, though the magnetic property shows a slight increase in compensation temperature toward the edge. This slight change was found to come from a change in composition of the metals. A further increase in uniformity was achieved by intentionally introducing a small amount of oxygen during the deposition process.