Chemically vapor deposited Ti3SiC2
- 30 September 1987
- journal article
- Published by Elsevier in Materials Research Bulletin
- Vol. 22 (9), 1195-1201
- https://doi.org/10.1016/0025-5408(87)90128-0
Abstract
No abstract availableKeywords
Funding Information
- Ministry of Education, Culture, Sports, Science and Technology (60430019)
This publication has 2 references indexed in Scilit:
- Chemical vapour-deposited silicon nitrideJournal of Materials Science, 1977
- Gasphasenabscheidung im system TiSiCJournal of the Less Common Metals, 1972