Precision measurements on the angular and temperature dependence of sputtering

Abstract

Sputtering ratios of 20 keV Ar⁺ and Ne⁺ bombardment of (100) and (111) Cu crystals have been determined as a function of the angle of incidence at the target temperature 303 K and at a target temperature in the vicinity of 130 K. The angular behaviour of the sputtering ratio in the neighbourhood of a low index direction can be described with Onderdelinden's model. The influence of the temperature of the target on sputtering has been found to be largest for angles between the low index direction and the critical angle.