Precision measurements on the angular and temperature dependence of sputtering
- 1 May 1972
- journal article
- research article
- Published by Taylor & Francis in Radiation Effects
- Vol. 14 (1), 93-100
- https://doi.org/10.1080/00337577208230477
Abstract
Sputtering ratios of 20 keV Ar+ and Ne+ bombardment of (100) and (111) Cu crystals have been determined as a function of the angle of incidence at the target temperature 303 K and at a target temperature in the vicinity of 130 K. The angular behaviour of the sputtering ratio in the neighbourhood of a low index direction can be described with Onderdelinden's model. The influence of the temperature of the target on sputtering has been found to be largest for angles between the low index direction and the critical angle.Keywords
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- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969
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