Silicon dioxide as a high temperature stabilizer for silver films
- 1 August 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 45 (1), 159-168
- https://doi.org/10.1016/0040-6090(77)90221-8
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- The role of microstructure and surface energy in hole growth and island formation in thin silver filmsSurface Science, 1972
- Hillock formation by surface diffusion on thin silver filmsSurface Science, 1972
- Hillock Growth on Vacuum Deposited Aluminum FilmsJournal of Vacuum Science and Technology, 1972
- Kinetics of hillock and island formation during annealing of thin silver filmsProgress in Surface Science, 1972
- Hillock-free aluminum thin films for electronic devicesMetallurgical Transactions, 1971
- Stress Relief and Hillock Formation in Thin Lead FilmsJournal of Applied Physics, 1970
- REVERSIBLE HILLOCK GROWTH IN THIN FILMSApplied Physics Letters, 1969
- Pin hole formation in tin films on cryogenically cooled substratesSurface Science, 1969
- Mechanisms of Stress Relief in Polycrystalline FilmsIBM Journal of Research and Development, 1969
- Hillock Growth and Stress Relief in Sputtered Au FilmsJournal of Applied Physics, 1969