I n s i t u observation on electron beam induced chemical vapor deposition by Auger electron spectroscopy

Abstract

W deposition, using WF₆ gas source by electron beam induced surface reaction, has been studied by Auger electron spectroscopy. W Auger electron signals have been observed for WF₆ adlayer by Auger electron spectroscopy. Moreover, initial growth for W deposition has been observed in situ by Auger electron spectroscopy. As a result, it became clear that a growth rate for W deposition is proportional to WF₆ gas pressure and can be ∼1 Å/min at 2×10⁻⁷ Torr.