Improved tungsten absorber technology for sub-half-micron x-ray lithography
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4), 259-264
- https://doi.org/10.1016/0167-9317(87)90047-5
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Defects in x-ray masks: Detection and printabilityJournal of Vacuum Science & Technology B, 1987
- Comparison of the structure and electrical properties of thin tungsten films deposited by radio frequency sputtering and ion beam sputteringJournal of Applied Physics, 1985