Ion beam etching using saddle field sources
- 1 December 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 86 (2-3), 117-124
- https://doi.org/10.1016/0040-6090(81)90281-9
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Observation of electron traps in electrochemically deposited CdTe filmsSolid-State Electronics, 1981
- Optimization of an electron-bombardment ion source for ion machining applicationsJournal of Vacuum Science and Technology, 1975
- A saddle field ion source of spherical configuration for etching and thinning applicationsVacuum, 1974
- A Charged Particle OscillatorJournal of Vacuum Science and Technology, 1972