Electron beam lithography over topography
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4), 53-56
- https://doi.org/10.1016/0167-9317(95)00193-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Empirical forms for the electron/atom elastic scattering cross sections from 0.1 to 30 keVJournal of Applied Physics, 1994
- Low voltage alternative for electron beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- An empirical stopping power relationship for low‐energy electronsScanning, 1989
- Energy dissipation in a thin polymer film by electron beam scatteringJournal of Applied Physics, 1974
- Zur Theorie des Durchgangs schneller Korpuskularstrahlen durch MaterieAnnalen der Physik, 1930