Different pulse techniques for stationary reactive sputtering with double ring magnetron
- 30 November 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 120-121, 723-727
- https://doi.org/10.1016/s0257-8972(99)00365-5
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputteringSurface and Coatings Technology, 1998
- Fabrication and characterization of graded refractive index silicon oxynitride thin filmsJournal of Vacuum Science & Technology A, 1997
- Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputteringSurface and Coatings Technology, 1996
- Characterization of silicon oxynitride thin films by infrared reflection absorption spectroscopyJournal of Vacuum Science & Technology A, 1996
- High-rate reactive sputter deposition of aluminum oxideJournal of Vacuum Science & Technology A, 1989
- Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixturesJournal of Vacuum Science and Technology, 1980