X-ray photoelectron spectroscopy of surface-treated indium-tin oxide thin films
- 1 December 1999
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 315 (5-6), 307-312
- https://doi.org/10.1016/s0009-2614(99)01233-6
Abstract
No abstract availableThis publication has 18 references indexed in Scilit:
- Improved operational stability of polyfluorene-based organic light-emitting diodes with plasma-treated indium–tin–oxide anodesApplied Physics Letters, 1999
- Photoelectron Spectroscopy and Quantum Chemical Modeling Applied to Polymer Surfaces and Interfaces in Light-Emitting DevicesAccounts of Chemical Research, 1999
- Interaction of water with the (1×1) and (2×1) surfaces of α-Fe2O3(012)Surface Science, 1998
- Polymer-based light-emitting devices: investigations on the role of the indium—tin oxide (ITO) electrodeSynthetic Metals, 1998
- Surface modification of indium tin oxide by plasma treatment: An effective method to improve the efficiency, brightness, and reliability of organic light emitting devicesApplied Physics Letters, 1997
- Surface Treatment of Indium-Tin-Oxide Substrates and Its Effects on Initial Nucleation Processes of Diamine FilmsJapanese Journal of Applied Physics, 1997
- Anomalous electrical characteristics, memory phenomena and microcavity effects in polymeric light-emitting diodesSynthetic Metals, 1996
- The interaction of H2O with a TiO2(110) surfaceSurface Science, 1994
- Structures and properties of electron-beam-evaporated indium tin oxide films as studied by x-ray photoelectron spectroscopy and work-function measurementsJournal of Applied Physics, 1993
- On the surface chemical reactions of metal and oxide XPS samples at 300–400° at a high vacuum produced by oil diffusion pumpsJournal of Electron Spectroscopy and Related Phenomena, 1975