An influence of the first adlayer structure on the sticking coefficient of the successive adsorption in a system of bismuth on silicon (111) surface
- 2 February 1981
- journal article
- Published by Elsevier in Surface Science
- Vol. 103 (2-3), 563-575
- https://doi.org/10.1016/0039-6028(81)90286-7
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Kinetics of deposition of bismuth film by a molecular beam methodSurface Science, 1979
- Cross Sections for Electron-Impact Fragmentation and Dissociation Energies of the Dimer and Tetramer of BismuthThe Journal of Chemical Physics, 1967
- Observation of Adsorption and Crystal Nucleation by Mass-Spectrometric TechniquesJournal of Vacuum Science and Technology, 1967
- Mass spectrometric determination of dissociation energies of molecules Bi2, Bi3, Bi4 and BiPbTransactions of the Faraday Society, 1967
- Surface reactions of silicon with aluminum and with indiumSurface Science, 1964
- Thermal desorption of gasesVacuum, 1962