Dynamic behavior of carbon ultrathin film formation
- 1 September 1998
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 84 (5), 2591-2596
- https://doi.org/10.1063/1.368420
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Validity of the Linear Growth Equation for Interface Evolution for Copper Electrodeposition in the Presence of Organic AdditivesPhysical Review Letters, 1997
- Symmetry of the Electronic States of Si Nanocrystals: An Experimental StudyPhysical Review Letters, 1997
- Surface diffusion of Ge on Si(111): Experiment and simulationPhysical Review B, 1997
- Nonlinear optical properties of silicon nanoclustersApplied Physics Letters, 1997
- Formation of Ion Irradiation Induced Small-Scale Defects on Graphite SurfacesPhysical Review Letters, 1996
- Scaling of surface roughness in a heterogeneous film growth system:on SiPhysical Review B, 1996
- Atomic force microscope study of growth kinetics: Scaling in the heteroepitaxy of CuCl on(111)Physical Review Letters, 1994
- Fabrication of W/C Multilayers by Direct Ion Beam DepositionMRS Proceedings, 1993
- Kinetic growth with surface relaxation: Continuum versus atomistic modelsPhysical Review Letters, 1991
- Activation energy for surface diffusion of Si on Si(001): A scanning-tunneling-microscopy studyPhysical Review Letters, 1991