Stoichiometry of Ta–N Film and Its Application for Diffusion Barrier in the Al3Ta/Ta–N/Si Contact System
- 1 June 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (6R)
- https://doi.org/10.1143/jjap.29.1043
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Superconducting Thin Films of Niobium, Tantalum, Tantalum Nitride, Tantalum Carbide, and Niobium NitrideJournal of the Electrochemical Society, 1964