Direct functionalization of silicon via the self-assembly of alcohols

Abstract

The reaction of fluoride-etched silicon surfaces with a range of alcohols yields self-assembled films which involve direct bonding to silicon in contrast with the usual oxide-based methods. Contact-angle measurements and electrochemistry have been used to confirm the adsorption of alcohols on fluoride-etched silicon (111) wafers. This method provides a convenient route to the design of molecular-based structures on silicon.