Recombination, Attachment, and Ambipolar Diffusion of Electrons in Photo-Ionized NO Afterglows

Abstract
Photo-ionized plasma afterglows of NO have been studied by combined microwave and mass-spectrometric techniques. Nitric-oxide-neon mixtures (5-65 mTorr NO, 2-7 Torr Ne) are contained in a 10-cm resonant cavity where they are ionized by a "single pulse" of Lyman-α radiation. A temporal spectrum of ions diffusing to the wall is obtained by a differentially pumped mass spectrometer and multichannel analyzer. Analysis of the electron-density decay curves obtained by microwave techniques to obtain an electron-ion recombination coefficient for NO+ is complicated by the conversion of NO+ to the dimer ion, (NO)2+. At sufficiently low densities of nitric oxide the (NO)2+ concentration becomes negligible, and the NO+ wall current tracks the electron-density decay. From comparisons of experimental electron-density decay curves obtained under recombination-controlled conditions, with computer solutions of the electron-continuity equation, the values α(NO+)=(7.4±0.7), (4.1±{0.3}{0.2}), and (3.1±0.2)×107 cm3/sec, at T=200, 300, and 450°K, respectively, are obtained. From analysis of electron-density decay curves at higher densities of NO, where (NO)2+ is the dominant ion, the value α(NO)2+=(1.7±0.4)×106 cm3/sec at T=300°K is obtained. The three-body electron-attachment and ambipolar diffusion coefficients have been measured in pure NO (0.1-5 Torr) and are found to be K=(1.3±0.1)×1031 cm6/sec and Dap=80±16 cm2 Torr/sec, respectively, at T=300°K.